Tool List: Pictures and specifications of our equipment
Electron Beam Lithography
Chalmers and MC2 have many years of experience and are extremely competent in the use of electron beam lithography. Chalmers is the clear leader in EBL in Scandinavia. Currently two EBL systems are in operation in the cleanroom, one JEOL JBX-9300FS and one Raith EBPG-5200, currently writing features down to 8 nm. EBL is one of the most popular processing services that the Laboratory provides to commercial and academic clients, patterning a wide variety of substrates for diverse applications.”
Thin Film Deposition
A wide variety of metal and insulating thin films can be deposited by a number of evaporation and sputter systems.
The Laboratory has a wide assortment of plasma tools for dry etching and deposition.
Chalmers has the ability to thermally process Si wafers up to 150 mm in diameter in its 4 four-stack Centrotherm E2000 furnaces capable of LPCVD, oxidation, drive-in, and annealing.
MBE of III-V materials
An EPI 930 MBE system is used in the Laboratory predominantly to grow III-V based heterostructures for microwave device applications. The following material combinations are possible: Ga, Al, In / N, P, As