Broad Ion-Beam (BIB)

In a Broad Ion-Beam (BIB) instrument, a beam of heavy ions, typically Ar, is used to bombard a target material, thereby sputtering atoms from the target surface. As the name of the technique implies, the milling process typically takes place over a wide area, several hundred microns up to 1-2 millimeters in diameter.

BIB instruments have been extensively used in materials research for a few decades. The major applications within CMAL have been to produce high quality TEM samples or cross sectional cuts of materials normal to the sample surface to study, e.g. interfaces and bulk matter. The former approach is often referred to as ion polishing. Since the ion polishing process is rather slow it is important that the samples are pre-thinned by e.g. mechanical grinding and polishing or chemical polishing.

Chalmers Materials Analysis Laboratory has three different broad ion-beams; Fischione Model 1010, Gatan Model 691, and Leica EM TIC 3X, all equipped with an Ar ion source for material sputtering. The first two instruments are used for final thinning and cleaning of pre-thinned TEM samples. The Leica BIB is used for producing large, broad cross section, several hundred microns in size.


Fischione IM1010

Quick facts:
•    Ion source: Ar
•    Accelerating voltage: V
•    Equipped with cooling stage
 
 

 

Gatan PIPS

Quick facts:
•    Ion source: Ar
•    Accelerating voltage: 0.1 kV to 6.0 kV
 
 


 
 

Leica TIC 3X

Quick facts:
•    Ion source: Ar
•    Accelerating voltage: 1 to 10 kV
•    Equipped with cooling stage

Published: Wed 25 Mar 2015. Modified: Thu 22 Jun 2017