The photo shows the NanoSIMS laboratory.

NanoSIMS and ToF-SIMS

The NanoSIMS 50L in Gothenburg is the first of these instruments in Scandinavia. A nanoSIMS offers μg/g or better detection limits for most elements, essentially periodic table coverage, 50 nm imaging and depth profiling capabilities, and isotopic analyses of major and minor elements on a wide range of materials. The NanoSIMS is suitable for a wide variety of applications, for example, grain boundary analysis, characterization of stress corrosion cracking, sub-cellular drug/peptide imaging and nitrogen fixation studies in bacteria. 


Cameca NanoSIMS 50L
The CAMECA NanoSIMS 50L is a unique ion microprobe optimizing SIMS analysis performance at high lateral resolution. It is based on a coaxial optical design of the ion gun and the Secondary ion extraction, and on an original magnetic sector mass analyzer with multicollection.

NanoSIMS 50L delivers simultaneously several key performances that can only be obtained individually with any other known instrument or technique:

  • High analysis spatial resolution (down to 50 nanometers)
  • High sensitivity (ppm in element imaging),
  • High Mass Resolution (M/dM),
  • Parallel acquisition of seven masses,
  • Fast acquisition (DC mode, not pulsed),
  • Analysis of electrically insulating samples without problem.
And thanks to recent improvements, isotope ratio reproducibility of a few tenths of permil can now be achieved.

IONTOF V
The industry standard ToFSIMS 5 imaging instrument from IONTOF is equipped with a bismuth cluster ion gun for sub-micron imaging along with a Cs/C60 sputter gun for depth profiling of organic and inorganic materials.
The instrument is equipped with a reflectron TOF analyser giving high secondary ion transmission with high mass resolution, a sample chamber with a 5-axis manipulator (x, y, z, rotation and tilt) for flexible navigation, a fast entry load-lock, charge compensation for the analysis of insulators, a secondary electron detector for SEM imaging, a state-of-the-art vacuum system, and an extensive computer package for automation and data handling.

  • High imaging resolution with Bi cluster ion source (150 nm)
  • Outstanding performance for low energy depth profiling
  • Small area depth profiling capabilities
  • Unmatched dynamic range and detection limit
  • Sophisticated software for ease of operation and data handling

Published: Tue 28 Jun 2016. Modified: Tue 08 Oct 2019